Martin Bischoff
at Fraunhofer-IOF
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 4 October 2011 Paper
Proceedings Volume 8168, 81681W (2011) https://doi.org/10.1117/12.896775
KEYWORDS: Coating, Ultraviolet radiation, Oxides, Refractive index, Silicon, Thin films, Glasses, Temperature metrology, Silica, Semiconducting wafers

Proceedings Article | 22 April 2009 Paper
Nils Beermann, Holger Blaschke, Henrik Ehlers, Detlev Ristau, Dirk Wulff-Molder, Sigrid Jukresch, Ansgar Matern, Martin Bischoff, Dieter Gäbler, Norbert Kaiser
Proceedings Volume 7131, 713117 (2009) https://doi.org/10.1117/12.816706
KEYWORDS: Resonators, Reflectors, Contamination, Excimer lasers, Laser optics, Optical coatings, Crystals, Interfaces, Laser resonators, Mirrors

Proceedings Article | 30 December 2008 Paper
H. Blaschke, N. Beermann, H. Ehlers, D. Ristau, M. Bischoff, D. Gäbler, N. Kaiser, A. Matern, D. Wulff-Molder
Proceedings Volume 7132, 71321A (2008) https://doi.org/10.1117/12.804428
KEYWORDS: Excimer lasers, Coating, Reflectors, Transmittance, Crystals, Ions, Interfaces, Electron microscopy, Reflectivity, Carbonates

Proceedings Article | 25 September 2008 Paper
Proceedings Volume 7101, 71010L (2008) https://doi.org/10.1117/12.797422
KEYWORDS: Metals, Thin films, Magnesium fluoride, Absorption, Refractive index, Ions, Fluorine, Photometry, Deposition processes, Surface roughness

Proceedings Article | 5 October 2005 Paper
Proceedings Volume 5963, 59631N (2005) https://doi.org/10.1117/12.624603
KEYWORDS: Mirrors, Reflectivity, Plasma, Tolerancing, Electron beams, Refractive index, Ions, Ultrafast phenomena, Niobium, Error analysis

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