Martin Bloecker
at Advanced Mask Technology Ctr GmbH Co KG
SPIE Involvement:
Publications (7)

Proceedings Article | 25 September 2010 Paper
Proceedings Volume 7823, 782309 (2010)
KEYWORDS: Photomasks, Vestigial sideband modulation, Beam shaping, Metals, Lithography, Electron beam lithography, Optical proximity correction, Source mask optimization, Computational lithography, Integrated optics

Proceedings Article | 20 October 2006 Paper
M. Bloecker, R. Gladhill, P. Buck, M. Kempf, D. Aguilar, R. Cinque
Proceedings Volume 6349, 63490Z (2006)
KEYWORDS: Photomasks, Critical dimension metrology, Lithography, Beam shaping, Vestigial sideband modulation, Manufacturing, Electronic design automation, Optical proximity correction, Control systems, Electron beam lithography

Proceedings Article | 21 June 2006 Paper
Proceedings Volume 6281, 62810H (2006)
KEYWORDS: Optical proximity correction, Photomasks, Vestigial sideband modulation, Logic, SRAF, Reticles, Resolution enhancement technologies, Manufacturing, Metals, Data storage

Proceedings Article | 28 May 2003 Paper
Proceedings Volume 5148, (2003)
KEYWORDS: Critical dimension metrology, Etching, Photomasks, Data corrections, Data modeling, Dry etching, Convolution, Chromium, Plasma etching, Chlorine

Proceedings Article | 27 December 2002 Paper
Proceedings Volume 4889, (2002)
KEYWORDS: Critical dimension metrology, Etching, Data corrections, Photomasks, Dry etching, Data modeling, Convolution, Plasma etching, Chromium, Computed tomography

Showing 5 of 7 publications
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