Dr. Martin Burkhardt
at IBM Thomas J Watson Research Ctr
SPIE Involvement:
Conference Program Committee | Editorial Board Member: Journal of Micro/Nanopatterning, Materials, and Metrology | Editorial Board Member: Journal of Micro/Nanolithography, MEMS, and MOEMS | Author
Publications (39)

Proceedings Article | 9 March 2021 Presentation + Paper
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII
KEYWORDS: Printing

Proceedings Article | 24 February 2021 Presentation + Paper
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII
KEYWORDS: Optical lithography, Etching, Scanners, Inspection, Extreme ultraviolet lithography, Source mask optimization, Photoresist processing, Semiconducting wafers, Stochastic processes, Resolution enhancement technologies

Proceedings Article | 22 February 2021 Presentation
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII
KEYWORDS: Optical lithography, Roads, Modulation, Metals, Materials processing, Printing, Extreme ultraviolet, Transistors, Extreme ultraviolet lithography, Yield improvement

SPIE Journal Paper | 1 July 2020
JM3 Vol. 19 Issue 03
KEYWORDS: Stochastic processes, Fiber optic illuminators, Line edge roughness, Critical dimension metrology, Defect inspection, Extreme ultraviolet, Inspection, Optical lithography, Yield improvement

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Optical lithography, Etching, Inspection, Bridges, Extreme ultraviolet, Critical dimension metrology, Line edge roughness, Stochastic processes, Defect inspection

Showing 5 of 39 publications
Conference Committee Involvement (7)
Optical / EUV Nanolithography and Practices
27 February 2022 | San Jose, California, United States
Optical Lithography XXXIV
22 February 2021 | Online Only, California, United States
Extreme Ultraviolet (EUV) Lithography XII
22 February 2021 | Online Only, California, United States
Extreme Ultraviolet (EUV) Lithography XI
24 February 2020 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography X
25 February 2019 | San Jose, California, United States
Showing 5 of 7 Conference Committees
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