Martin Drapeau
Corporate Application Engineer at Synopsys Inc
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Metrology, Data modeling, Calibration, Scanning electron microscopy, Nomenclature, Photomasks, Optical proximity correction, Optical alignment, Data conversion, Semiconducting wafers

Proceedings Article | 19 May 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Metrology, Logic, Data modeling, Calibration, Optical proximity correction, Picosecond phenomena, Optimization (mathematics), Statistical modeling, Performance modeling, Process modeling

Proceedings Article | 19 March 2008
Proc. SPIE. 6925, Design for Manufacturability through Design-Process Integration II
KEYWORDS: Lithography, Logic, Lithographic illumination, Inspection, Printing, Photomasks, Double patterning technology, Optical proximity correction, Critical dimension metrology, Binary data

Proceedings Article | 27 March 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Lithography, Metrology, Optical lithography, Error analysis, Manufacturing, Photomasks, Optical proximity correction, SRAF, OLE for process control, Resolution enhancement technologies

Proceedings Article | 21 March 2007
Proc. SPIE. 6521, Design for Manufacturability through Design-Process Integration
KEYWORDS: Lithography, Logic, Optical lithography, Etching, Image processing, Process control, Photomasks, Double patterning technology, Immersion lithography, Optical proximity correction

Showing 5 of 10 publications
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