Dr. Martin Ebert
SPIE Involvement:
Publications (8)

Proceedings Article | 20 March 2020 Paper
Eric Ma, Weiming Ren, Xinan Luo, Shuo Zhao, Xuerang Hu, Xuedong Liu, Chiyan Kuan, Kevin Chou, Martijn Maassen, Weihua Yin, Aiden Chen, Niladri Sen, Martin Ebert, Lei Liu, Fei Wang, Oliver Patterson
Proceedings Volume 11325, 113250F (2020) https://doi.org/10.1117/12.2553556
KEYWORDS: Inspection, Semiconducting wafers, Electrons, Optical inspection, Defect detection, System integration, Defect inspection, Image processing, Image quality standards, Semiconductor manufacturing

Proceedings Article | 29 August 2019 Paper
Proceedings Volume 11177, 111770D (2019) https://doi.org/10.1117/12.2536565
KEYWORDS: Inspection, Semiconducting wafers, Photomasks, Electron beams, Defect inspection, Optical inspection, Signal detection, Sensors, Computer architecture, Defect detection

Proceedings Article | 26 March 2019 Paper
Proceedings Volume 10959, 109591R (2019) https://doi.org/10.1117/12.2515272
KEYWORDS: Inspection, Defect detection, Optical inspection, Photomasks, Semiconducting wafers, Image quality, Extreme ultraviolet, Computing systems, Semiconductors, Semiconductor manufacturing

Proceedings Article | 28 March 2017 Paper
Kai-Hsiung Chen, Guo-Tsai Huang, Hung-Chih Hsieh, Wei-Feng Ni, S. M. Chuang, T. K. Chuang, Chih-Ming Ke, Jacky Huang, Shiuan-An Rao, Aysegul Cumurcu Gysen, Maxime d'Alfonso, Jenny Yueh, Pavel Izikson, Aileen Soco, Jon Wu, Tjitte Nooitgedagt, Jeroen Ottens, Yong Ho Kim, Martin Ebert
Proceedings Volume 10145, 1014528 (2017) https://doi.org/10.1117/12.2257894
KEYWORDS: Overlay metrology, Metrology, High volume manufacturing, Scatterometry, Diffraction, Optical metrology, Lithography, Process control, Optical lithography, Time metrology, Image registration, Target acquisition, Semiconducting wafers

Proceedings Article | 24 March 2016 Paper
M. Ebert, P. Vanoppen, M. Jak, G. v. d. Zouw, H. Cramer, T. Nooitgedagt, H. v. d. Laan
Proceedings Volume 9778, 97782N (2016) https://doi.org/10.1117/12.2219946
KEYWORDS: Control systems, Overlay metrology, Metrology, Optical metrology, Process control, Critical dimension metrology, Diffraction, Signal processing, Image processing, Scatterometry, Opacity, Semiconducting wafers, Lithography, Scanners

Showing 5 of 8 publications
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