Dr. Martin Ebert
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 29 August 2019
Proc. SPIE. 11177, 35th European Mask and Lithography Conference (EMLC 2019)
KEYWORDS: Electron beams, Defect detection, Sensors, Inspection, Optical inspection, Photomasks, Semiconducting wafers, Computer architecture, Signal detection, Defect inspection

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Semiconductors, Defect detection, Inspection, Computing systems, Optical inspection, Image quality, Photomasks, Extreme ultraviolet, Semiconductor manufacturing, Semiconducting wafers

Proceedings Article | 28 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Lithography, Diffraction, Metrology, Optical lithography, Image registration, Scatterometry, Optical metrology, Time metrology, Process control, High volume manufacturing, Target acquisition, Semiconducting wafers, Overlay metrology

Proceedings Article | 24 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Diffraction, Metrology, Opacity, Image processing, Scanners, Control systems, Scatterometry, Optical metrology, Signal processing, Process control, Critical dimension metrology, Semiconducting wafers, Overlay metrology

Proceedings Article | 2 April 2011
Proc. SPIE. 7985, 27th European Mask and Lithography Conference
KEYWORDS: Lithography, Metrology, Sensors, Scanners, Data processing, 3D metrology, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Overlay metrology

Showing 5 of 7 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top