Dr. Martin Glodde
Researcher at IBM Thomas J Watson Research Ctr
SPIE Involvement:
Author
Publications (13)

PROCEEDINGS ARTICLE | March 28, 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Oxides, Lithography, Etching, Metals, Dielectrics, Scanning electron microscopy, Directed self assembly, Critical dimension metrology, Tin, Back end of line

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Oxides, Etching, Interfaces, Silicon, Materials processing, Image resolution, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Head-mounted displays, Photoresist processing, Semiconducting wafers, Systems modeling

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Carbon, Polymers, Reactive ion etching, Semiconducting wafers

PROCEEDINGS ARTICLE | March 25, 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Contamination, Deep ultraviolet, Photons, Hydrogen, Quantum efficiency, Photoresist materials, Image quality, Iodine, Extreme ultraviolet, Semiconductor manufacturing, Extreme ultraviolet lithography, Absorption, Chemically amplified resists

PROCEEDINGS ARTICLE | March 27, 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Carbon, Lithography, Optical lithography, Glasses, Resistance, Fourier transforms, Chemical vapor deposition, Photoresist materials, Photomasks, Fin field effect transitor

PROCEEDINGS ARTICLE | March 20, 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Roads, Etching, Polymers, Image processing, Scanning electron microscopy, Optical proximity correction, Reactive ion etching, Neodymium, Semiconducting wafers, Photoresist developing

Showing 5 of 13 publications
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