Dr. Martin Hacker Profile

Dr. Martin Hacker

Staff Scientist at Advanced Mask Technology Ctr GmbH Co KG

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Publications (1)

Proceedings Article | 14 October 2011 Paper

More than monitoring: advanced lithographic process tuning

Jo Alvin Dumaya, Christian Bürgel, Martin Häcker, G. R. Cantrell, Axel Feicke, Clemens Utzny

Proceedings Volume 8166, 81660M (2011) https://doi.org/10.1117/12.896416

KEYWORDS: Critical dimension metrology, Photoresist processing, Lithography, Reticles, Principal component analysis, Photomasks, Etching, Cadmium, Statistical analysis, Chemically amplified resists

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