Dr. Martin Hacker
Staff Scientist at Advanced Mask Technology Ctr GmbH Co KG
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Reticles, Principal component analysis, Statistical analysis, Cadmium, Etching, Photomasks, Critical dimension metrology, Photoresist processing, Chemically amplified resists

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