Dr. Martin C. Keck
Principal Resolution Enhancement Techniques at Qimonda AG
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 28 March 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Optical proximity correction, Process modeling, Data modeling, Photoresist processing, Etching, Error analysis, Scanning electron microscopy, 3D modeling, Wafer-level optics, Statistical modeling

Proceedings Article | 28 June 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Optical proximity correction, Photomasks, Data modeling, Semiconducting wafers, Lithography, Printing, Scanning electron microscopy, Critical dimension metrology, Manufacturing, Phase shifts

Proceedings Article | 17 December 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Optical proximity correction, Data modeling, Photomasks, Scanning electron microscopy, Printing, Manufacturing, Semiconducting wafers, Critical dimension metrology, Lithography, Data processing

Proceedings Article | 22 January 2001
Proc. SPIE. 4186, 20th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Inspection, Photomasks, Manufacturing, Optical proximity correction, Inspection equipment, Computed tomography, Detection and tracking algorithms, Bridges, Tungsten, Silver

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