Dr. Martin C. Keck
Principal Resolution Enhancement Techniques at Qimonda AG
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 28 March 2007 Paper
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Wafer-level optics, Data modeling, Etching, Error analysis, 3D modeling, Scanning electron microscopy, Optical proximity correction, Photoresist processing, Statistical modeling, Process modeling

Proceedings Article | 28 June 2005 Paper
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Lithography, Data modeling, Manufacturing, Scanning electron microscopy, Printing, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Phase shifts

Proceedings Article | 17 December 2003 Paper
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Data modeling, Manufacturing, Scanning electron microscopy, Printing, Data processing, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 22 January 2001 Paper
Proc. SPIE. 4186, 20th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Detection and tracking algorithms, Tungsten, Silver, Manufacturing, Inspection, Inspection equipment, Bridges, Photomasks, Computed tomography, Optical proximity correction

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