Dr. Martin Lowisch
at Carl Zeiss SMT GmbH
SPIE Involvement:
Author
Publications (18)

Proceedings Article | 17 April 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Reticles, Metrology, Logic, Imaging systems, Scanners, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Semiconducting wafers

Proceedings Article | 1 April 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Wafer-level optics, Lithography, Mirrors, Reticles, Scanners, Image resolution, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Overlay metrology

Proceedings Article | 1 April 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Mirrors, Eye, Ions, Coating, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Neodymium, Optics manufacturing, EUV optics

Proceedings Article | 23 March 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Mirrors, Reticles, Scanners, Particles, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Overlay metrology

Proceedings Article | 7 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Reticles, Contamination, Manufacturing, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, High volume manufacturing, Semiconducting wafers, Optics manufacturing, Overlay metrology

Showing 5 of 18 publications
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