Martin E. Mastovich
at Inspectrology LLC
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 28 May 2004 Paper
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Optical lithography, Distortion, Scanning electron microscopy, Optical vortices, Photomasks, Cadmium sulfide, Critical dimension metrology, Semiconducting wafers, Spiral phase plates, Phase shifts

Proceedings Article | 2 June 2003 Paper
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Lithography, Electron beams, Metrology, Scanning electron microscopy, Chemical analysis, Critical dimension metrology, Photoresist processing, Semiconducting wafers, 193nm lithography, Temperature metrology

Proceedings Article | 2 June 2003 Paper
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Internet, Metrology, Databases, Pattern recognition, Diagnostics, Scanning electron microscopy, Image quality, Process control, Data communications, Computer security

Proceedings Article | 2 June 2003 Paper
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Electron beams, Metrology, Contamination, Data modeling, Atomic force microscopy, Scanning electron microscopy, Process control, Critical dimension metrology, Semiconducting wafers, Systems modeling

Proceedings Article | 2 June 2003 Paper
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Electron beams, Metrology, Diffractive optical elements, Image acquisition, Scanning electron microscopy, Process control, Transistors, Critical dimension metrology, Line edge roughness, Semiconducting wafers

Showing 5 of 11 publications
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