Dr. Martin McCallum
Technical Marketing Manager
SPIE Involvement:
Symposium Chair | Conference Program Committee | Author
Publications (40)

Proceedings Article | 13 March 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Optical alignment, System on a chip, Lithography, Semiconducting wafers, Image processing, Optical lithography, Scanning electron microscopy, Scanners, Signal processing, Photoresist processing

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Optical alignment, Double patterning technology, Scanners, Lithography, Overlay metrology, Optical lithography, Critical dimension metrology, Semiconducting wafers, Double positive medium, Etching

Proceedings Article | 2 April 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Optical proximity correction, Resistance, Metals, Photomasks, Semiconducting wafers, Inspection, Wafer-level optics, Aluminum, Physics, Optical lithography

Proceedings Article | 23 September 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Optical proximity correction, Resistance, Semiconducting wafers, Photomasks, Inspection, Wafer-level optics, Oxides, Scanning electron microscopy, Physics, Resistors

Proceedings Article | 27 May 2009
Proc. SPIE. 7470, 25th European Mask and Lithography Conference
KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Reticles, Double patterning technology, Pellicles, Lithography, Image registration, Optical alignment, Scanners

Showing 5 of 40 publications
Conference Committee Involvement (2)
Lithography for Semiconductor Manufacturing
19 May 1999 | Edinburgh, United Kingdom
Microelectronic Manufacturing Technologies
19 May 1999 | Edinburgh, United Kingdom
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