Dr. Martin J. Neumann
Postdoctural Fellow
SPIE Involvement:
Author
Publications (19)

Proceedings Article | 20 March 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Carbon, Chemical species, Sputter deposition, Particles, Electrons, Ions, Photomasks, Helium, Semiconducting wafers, Plasma

Proceedings Article | 20 March 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Sensors, Argon, Electrodes, Microchannel plates, Ions, Silicon, Diagnostics, Extreme ultraviolet, Plasma, Tin

Proceedings Article | 20 March 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Mirrors, Contamination, Etching, Ions, Extreme ultraviolet, Plasma etching, Reactive ion etching, Chlorine, Plasma, Tin

SPIE Journal Paper | 1 May 2009
OE Vol. 48 Issue 05
KEYWORDS: Gold, Molybdenum, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Mirrors, Ruthenium, Plasma, Photodiodes, Argon

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Semiconductors, Argon, Sputter deposition, Image processing, Ions, Scanning electron microscopy, Photoresist materials, Ion beams, Line width roughness, Line edge roughness

Proceedings Article | 4 December 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Chemical species, Particles, Silicon, Photomasks, Extreme ultraviolet lithography, Helium, Semiconducting wafers, Atmospheric particles, Plasma

Showing 5 of 19 publications
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