Martin Niehoff
Application Engineer at Mentor Graphics (Deutschland) GmbH
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Author
Publications (12)

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Metrology, Cadmium, Data modeling, Imaging systems, Scanners, Scanning electron microscopy, Printing, Scatterometry, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 4 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Photovoltaics, Reticles, Logic, Optical lithography, Manufacturing, Inspection, Photomasks, Optical proximity correction, 193nm lithography

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Logic, Lithographic illumination, Silicon, Manufacturing, Photomasks, Optical proximity correction, Semiconducting wafers, 193nm lithography, Resolution enhancement technologies

Proceedings Article | 2 May 2008
Proc. SPIE. 6792, 24th European Mask and Lithography Conference
KEYWORDS: Lithography, Etching, Metals, Distortion, Scanning electron microscopy, Photomasks, Transistors, Optical proximity correction, Critical dimension metrology, Line edge roughness

Proceedings Article | 1 April 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Finite-difference time-domain method, Polarization, Interfaces, Computer simulations, 3D modeling, Near field, Photomasks, Optical proximity correction, Semiconducting wafers

Proceedings Article | 7 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Data modeling, Calibration, Etching, Design for manufacturing, Optical proximity correction, Critical dimension metrology, Photoresist processing, Optics manufacturing, Process modeling

Showing 5 of 12 publications
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