Dr. Martin Samayoa
Technology Development Engineer at SUSS MicroTec Inc
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | October 20, 2016
Proc. SPIE. 10032, 32nd European Mask and Lithography Conference
KEYWORDS: Particles, Photons, Chemistry, Transducers, Photomasks, Extreme ultraviolet, Cavitation, Acoustics, Sonoluminescence, Acoustic cavitation

PROCEEDINGS ARTICLE | October 4, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Glasses, Particles, Inspection, Oxygen, Photomasks, SRAF, Cavitation, Acoustics, Mask cleaning, Plasma

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Gold, Metrology, Etching, Particles, Silicon, Atomic force microscopy, Scanning electron microscopy, Transmission electron microscopy, Raman spectroscopy, Spatial resolution

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Silica, Aerosols, Particles, Ions, Transmission electron microscopy, Photomasks, Extreme ultraviolet, Neodymium, Semiconducting wafers, Atmospheric particles

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