Dr. Martin Schulz Profile

Dr. Martin Schulz

Senior Staff R&D Engineer at Synopsys GmbH

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Publications (4)

Proceedings Article | 8 November 2012 Paper

Proximity effect correction optimizing image quality and writing time for an electron multi-beam mask writer

T. Klimpel, J. Klikovits, R. Zimmermann, M. Schulz, Alex Zepka, H.-J. Stock

Proceedings Volume 8522, 852229 (2012) https://doi.org/10.1117/12.964405

KEYWORDS: Image quality, Photomasks, Scanning electron microscopy, Nanoimprint lithography, Backscatter, Modulation, Acquisition tracking and pointing, Ions, Metals, Line width roughness

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Proceedings Article | 27 May 2010 Paper

Practical resist model calibration for e-beam direct write processes

Martin Schulz, Hans-Jürgen Stock, Ulrich Klostermann, Wolfgang Hoppe, Lars Bomholt, Philipp Jaschinsky, Kang-Hoon Choi, Manuela Gutsch, Holger Sailer, Stephan Martens

Proceedings Volume 7748, 774818 (2010) https://doi.org/10.1117/12.866695

KEYWORDS: Calibration, Monte Carlo methods, Photoresist processing, Electron beam lithography, Data modeling, Process modeling, Scanning electron microscopy, Computer simulations, Scattering, Chemically amplified resists

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Proceedings Article | 23 September 2009 Paper

Predictive modeling for EBPC in EBDW

Rainer Zimmermann, Martin Schulz, Wolfgang Hoppe, Hans-Jürgen Stock, Wolfgang Demmerle, Alex Zepka, Artak Isoyan, Lars Bomholt, Serdar Manakli, Laurent Pain

Proceedings Volume 7488, 74883J (2009) https://doi.org/10.1117/12.833482

KEYWORDS: Data modeling, 3D modeling, Electron beam direct write lithography, Point spread functions, Critical dimension metrology, Model-based design, Geometrical optics, Cadmium, Error analysis, Virtual reality

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Proceedings Article | 11 May 2009 Paper

Quantification of electron-beam proximity effects using a virtual direct write environment

Martin Schulz, Peter Brooker, Alex Zepka, Gary Meyers

Proceedings Volume 7379, 737921 (2009) https://doi.org/10.1117/12.824314

KEYWORDS: Point spread functions, Monte Carlo methods, Semiconducting wafers, Optical simulations, Lithography, Fourier transforms, Electron beam lithography, Photoresist processing, Stochastic processes, Scattering

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