Dr. Martin Sczyrba
at Advanced Mask Technology Ctr GmbH Co KG
SPIE Involvement:
Author
Publications (26)

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Reticles, Scattering, Scanners, Light scattering, Photomasks, Logic devices, Source mask optimization

PROCEEDINGS ARTICLE | November 9, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Diffraction, Refractive index, Finite-difference time-domain method, Deep ultraviolet, Silica, Polarization, Opacity, Phase shift keying, Near field, Photomasks, Phase measurement, Critical dimension metrology, Panoramic photography, Semiconducting wafers, Binary data, Airborne remote sensing, 193nm lithography, Absorption

PROCEEDINGS ARTICLE | March 26, 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Switches, Polarization, Imaging systems, Spatial frequencies, 3D modeling, Printing, Phase retrieval, Photomasks, Semiconducting wafers, Airborne remote sensing

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Finite-difference time-domain method, Polarization, Imaging systems, Error analysis, 3D modeling, Phase imaging, Photomasks, Semiconducting wafers, Phase shifts, Absorption

PROCEEDINGS ARTICLE | September 10, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Wafer-level optics, Data modeling, Polarization, Imaging systems, Printing, Phase imaging, Photomasks, Phase measurement, Semiconducting wafers, Phase shifts

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Lithography, Photovoltaics, Diffraction, Optical lithography, Printing, Photomasks, Optical proximity correction, SRAF, Nanoimprint lithography, Electromagnetism

Showing 5 of 26 publications
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