Dr. Martin Sczyrba
at Advanced Mask Technology Ctr GmbH Co KG
SPIE Involvement:
Author
Publications (29)

Proceedings Article | 26 September 2019
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Critical dimension metrology, Machine learning, Photomasks, Etching, Scanning electron microscopy, Convolution, Semiconductors, Quality measurement, Environmental sensing, Manufacturing

Proceedings Article | 29 August 2019
Proc. SPIE. 11177, 35th European Mask and Lithography Conference (EMLC 2019)
KEYWORDS: Machine learning, Data modeling, Critical dimension metrology, Performance modeling, Process control, Visualization, Data centers, Solids, Data processing, Optical inspection

Proceedings Article | 27 June 2019
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Critical dimension metrology, Machine learning, Data modeling, Process control, Visualization, Data centers, Solids, Detection and tracking algorithms, Data processing, Optical inspection

Proceedings Article | 20 March 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Photomasks, Scanners, Reticles, Light scattering, Scattering, Logic devices, Source mask optimization, Lithography

Proceedings Article | 9 November 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Polarization, Refractive index, Phase measurement, Near field, Absorption, Opacity, Silica, Photomasks, 193nm lithography, Semiconducting wafers, Diffraction, Phase shift keying, Critical dimension metrology, Airborne remote sensing, Finite-difference time-domain method, Panoramic photography, Binary data, Deep ultraviolet

Showing 5 of 29 publications
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