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Martin T.K. Soh
at Univ of Western Australia
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Publications (1)
Proceedings Article | 2 April 2004 Paper
Chemical structure of low-temperature plasma-deposited silicon nitride thin films
Proceedings Volume 5276, (2004) https://doi.org/10.1117/12.523243
KEYWORDS: Silicon, Absorption, Thin films, Oscillators, Silicon films, Infrared radiation, Plasma, Microelectromechanical systems, Thermography, Chemical vapor deposition
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