Martin Suelzle
at EQUIcon Software GmbH Jena
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | September 9, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Point spread functions, Etching, Silicon, Resistance, Photomasks, Line width roughness, Cadmium sulfide, Semiconducting wafers, Resolution enhancement technologies, Chemically amplified resists

PROCEEDINGS ARTICLE | April 17, 2012
Proc. SPIE. 8352, 28th European Mask and Lithography Conference
KEYWORDS: Target detection, Electron beam lithography, Electron beams, Cadmium, Sensors, Calibration, Scanning electron microscopy, Photomasks, Critical dimension metrology, Photoresist processing

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Semiconductors, Lithography, Electron beam lithography, Point spread functions, Scattering, Calibration, Monte Carlo methods, Cadmium sulfide, Critical dimension metrology, Photoresist processing

PROCEEDINGS ARTICLE | April 2, 2011
Proc. SPIE. 7985, 27th European Mask and Lithography Conference
KEYWORDS: Lithography, Electron beam lithography, Cadmium, Modulation, Backscatter, Scattering, Cadmium sulfide, Line edge roughness, Photoresist processing, Chemically amplified resists

PROCEEDINGS ARTICLE | September 25, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Electron beam lithography, Electron beams, Modulation, Scattering, Laser scattering, Cadmium sulfide, Convolution, Line edge roughness, Photoresist processing, Chemically amplified resists

PROCEEDINGS ARTICLE | May 15, 2010
Proc. SPIE. 7545, 26th European Mask and Lithography Conference
KEYWORDS: Semiconductors, Electron beam lithography, Calibration, Laser scattering, Computer simulations, Data processing, Line width roughness, Convolution, Photoresist processing, Data corrections

Showing 5 of 8 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top