Dr. Martin Tschinkl Profile

Dr. Martin Tschinkl

at Advanced Mask Technology Ctr. GmbH Co. KG

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 16 September 2014 Paper

Intra-field CDU map correlation between SEMs and aerial image characterization

Guoxiang Ning, Peter Philipp, Lloyd Litt, Stefan Meusemann, Thomas Thaler, Kristian Schulz, Martin Tschinkl, Paul Ackmann

Proceedings Volume 9235, 92350I (2014) https://doi.org/10.1117/12.2066173

KEYWORDS: Semiconducting wafers, Reticles, Metrology, Critical dimension metrology, Scanning electron microscopy, Metals, Optical proximity correction, Wafer-level optics, Inspection, Scanners

Read Abstract +

Proceedings Article | 28 June 2005 Paper

Application of a wafer development process to mask making

Gaston Lee, Celine Berger, Christian Burgel, Axel Feicke, Rusty Cantrell, Martin Tschinkl

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617104

KEYWORDS: Photomasks, Semiconducting wafers, Forward error correction, Reticles, Manufacturing, Chromium, Control systems, Standards development, Etching, Photoresist processing

Read Abstract +

Proceedings Article | 28 June 2005 Paper

Evaluation of e-beam sensitive CARs for advanced mask making

Axel Feicke, Mathias Irmscher, Anatol Schwersenz, Martin Tschinkl

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617111

KEYWORDS: Line edge roughness, Photoresist processing, Etching, Photomasks, Mask making, Scanning electron microscopy, Thin film coatings, Semiconducting wafers, Diffusion, Coating

Read Abstract +

Proceedings Article | 6 December 2004 Paper

Evaluation of a new-generation photomask develop system for CAR

Rusty Cantrell, Martin Tschinkl, Axel Feicke, Wolfram Porsche, Gaston Lee, Tatsuhito Kotoda, Peter Tichy, Takahiro Fukai, Shigenori Kamei, Hiroshi Asai

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.568393

KEYWORDS: Photomasks, Semiconducting wafers, Particles, Deep ultraviolet, Standards development, Lithography, Manufacturing, Photoresist processing, Control systems, Diffractive optical elements

Read Abstract +

Proceedings Article | 6 December 2004 Paper

First photomask developer based on state-of-the-art wafer processing technology

Peter Tichy, Takahiro Fukai, Shigenori Kamei, Hiroshi Asai, Tatsuhito Kotoda, Kazuhiro Takeshita, Tetsushi Miyamoto, Yoshiki Okamoto, Hideo Funakoshi, Shinji Koga, Shigemi Oono, Rusty Cantrell, Axel Feicke, Wolfram Porsche, Martin Tschinkl, Gaston Lee

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.568820

KEYWORDS: Photomasks, Semiconducting wafers, Photoresist developing, Manufacturing, Critical dimension metrology, Reticles, Control systems, Diffusion, Photoresist processing, Wafer manufacturing

Read Abstract +

Proceedings Article | 28 August 2003 Paper

Comparison of new film nozzle with standard nozzle for aqueous puddle developing of photomasks

Christian Buergel, Werner Saule, M. Strobl, Peter Dress, Anatol Schwersenz, Martin Tschinkl

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504190

KEYWORDS: Photomasks, Standards development, Inspection, Image processing, Photoresist processing, Critical dimension metrology, Chemically amplified resists, Scanning electron microscopy, 3D image processing, Silver

Read Abstract +

Proceedings Article | 28 August 2003 Paper

Investigation of e-beam sensitive negative-tone chemically amplified resists for binary mask making

Mathias Irmscher, Lothar Berger, Dirk Beyer, Joerg Butschke, Peter Dress, Thomas Hoffmann, Peter Hudek, Corinna Koepernik, Martin Tschinkl, Peter Voehringer

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504185

KEYWORDS: Photomasks, Etching, Coating, Mask making, Chemically amplified resists, Binary data, Line edge roughness, Photoresist processing, Optical proximity correction, Scanning electron microscopy

Read Abstract +

Proceedings Article | 27 December 2002 Paper

Negative chemically amplified resist (nCAR) for DRAM mask fabrications

Martin Tschinkl, Christian Buergel, Uwe Griesinger, Barbara Jeansannetas, Armelle Vix

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467429

KEYWORDS: Opacity, Line edge roughness, Coating, Critical dimension metrology, Chemically amplified resists, Photoresist processing, Mask making, Vestigial sideband modulation, Error analysis, Electron beams

Read Abstract +

Showing 5 of 8 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years