Dr. Martin Tuckermann
at KLA GmbH
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 24 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Lithography, Reticles, Logic, Modulation, Inspection, Wafer inspection, Semiconducting wafers, Product engineering, 193nm lithography, Defect inspection

Proceedings Article | 5 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Signal to noise ratio, Lithography, Etching, Coating, Inspection, Wafer inspection, Photomasks, Semiconducting wafers, Wafer testing, Defect inspection

Proceedings Article | 24 May 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Lithography, Molecular bridges, Particles, Inspection, Process control, Bridges, Photoresist processing, Semiconducting wafers, Standards development, Defect inspection

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