Mary Jane Brodsky
at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | April 1, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Oxides, Lithography, Etching, Silicon, Reflectivity, Control systems, Photomasks, Critical dimension metrology, Semiconducting wafers, Chemical mechanical planarization

PROCEEDINGS ARTICLE | May 5, 2005
Proc. SPIE. 5756, Design and Process Integration for Microelectronic Manufacturing III
KEYWORDS: Lithography, Reticles, Optical lithography, Modulation, Manufacturing, Inspection, Photomasks, Optical proximity correction, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | May 12, 2004
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Polishing, Scanners, Manufacturing, Resistance, Semiconductor manufacturing, Immersion lithography, Critical dimension metrology, Semiconducting wafers, Bacteria

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