Dr. Mary E. Coles
Member of Technical Staff at Texas Instruments Inc
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | March 7, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Reticles, Edge detection, Data modeling, Scanning electron microscopy, Printing, Distance measurement, Optical proximity correction, SRAF, Space operations

PROCEEDINGS ARTICLE | March 21, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Monochromatic aberrations, Reticles, Scanners, Constructive interference, Scanning electron microscopy, Printing, Photomasks, Critical dimension metrology, Semiconducting wafers, Phase shifts

PROCEEDINGS ARTICLE | March 14, 2006
Proc. SPIE. 6156, Design and Process Integration for Microelectronic Manufacturing IV
KEYWORDS: Data modeling, Error analysis, Scanning electron microscopy, Data processing, Image filtering, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Process modeling

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