Dr. Masaaki Kurihara
General Manager at Dai Nippon Printing Co Ltd
SPIE Involvement:
Author
Publications (35)

PROCEEDINGS ARTICLE | October 12, 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Lithography, Process control, Photomasks, Nanoimprint lithography

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Semiconductors, Lithography, Photomasks, Nanoimprint lithography

PROCEEDINGS ARTICLE | April 27, 2017
Proc. SPIE. 10144, Emerging Patterning Technologies
KEYWORDS: Semiconductors, Lithography, Electron beam lithography, Optical lithography, Printing, Photomasks, Extreme ultraviolet lithography, Nanoimprint lithography, Semiconducting wafers, Current controlled current source

SPIE Journal Paper | February 5, 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Nanoimprint lithography, High volume manufacturing, Image processing, Critical dimension metrology, Lithography, Semiconductors, Semiconducting wafers, Photomasks, Ultraviolet radiation, Liquids

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Semiconductors, Lithography, Etching, Image processing, Distortion, Photomasks, High volume manufacturing, Nanoimprint lithography, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Silica, Quartz, Particles, Inspection, Surface roughness, Chromium, Nanoimprint lithography, Critical dimension metrology, Photoresist processing, Binary data

Showing 5 of 35 publications
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