Dr. Masaaki Kurihara
General Manager at Dai Nippon Printing Co Ltd
SPIE Involvement:
Author
Publications (35)

Proceedings Article | 12 October 2018 Presentation
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Nanoimprint lithography, Photomasks, Lithography, Process control

Proceedings Article | 19 March 2018 Presentation
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Nanoimprint lithography, Photomasks, Lithography, Semiconductors

Proceedings Article | 27 April 2017 Presentation
Proc. SPIE. 10144, Emerging Patterning Technologies
KEYWORDS: Printing, Current controlled current source, Nanoimprint lithography, Optical lithography, Lithography, Semiconductors, Electron beam lithography, Extreme ultraviolet lithography, Photomasks, Semiconducting wafers

SPIE Journal Paper | 5 February 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Nanoimprint lithography, High volume manufacturing, Image processing, Critical dimension metrology, Lithography, Semiconductors, Semiconducting wafers, Photomasks, Ultraviolet radiation, Liquids

Proceedings Article | 19 March 2015 Paper
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Nanoimprint lithography, Distortion, Image processing, Semiconducting wafers, Overlay metrology, Lithography, Etching, High volume manufacturing, Semiconductors, Photomasks

Showing 5 of 35 publications
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