Mr. Masaaki Yoshida
at Tokyo Ohka Kogyo Co Ltd
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | April 11, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Molecular bridges, Materials processing, Lens design, Bridges, Resonance energy transfer, Immersion lithography, Photoresist processing, Semiconducting wafers, 193nm lithography

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Contamination, Scanners, Ions, Silicon, Manufacturing, Silicon films, Immersion lithography, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | May 20, 2004
Proc. SPIE. 5374, Emerging Lithographic Technologies VIII
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Optical lithography, Polymers, Electroluminescence, Neodymium, Semiconducting wafers, Projection lithography, Protactinium

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