Masafumi Asano
Director at Tokyo Electron Ltd
SPIE Involvement:
Conference Program Committee | Author
Publications (40)

Proceedings Article | 28 March 2017 Paper
Ilya Osherov, Limor Issacharoff, Oram Gedalia, Koichi Wakamoto, Matthew Sendelbach, Masafumi Asano
Proceedings Volume 10145, 101451X (2017) https://doi.org/10.1117/12.2266577
KEYWORDS: Nanoimprint lithography, Semiconducting wafers, Metrology, Scatterometry, Lithography, Scatter measurement, Critical dimension metrology, Semiconductors, Optical lithography, Quality measurement, Scanning electron microscopy, 3D modeling

Proceedings Article | 28 March 2017 Presentation + Paper
Masafumi Asano, Hideaki Abe, Kazuto Matsuki, Ryoji Yoshikawa, Motofumi Komori, Takashi Hirano, Shinji Mikami, Yongho Kim, Eunhyuk Choi, Woo-Yung Jung
Proceedings Volume 10145, 101450J (2017) https://doi.org/10.1117/12.2258369
KEYWORDS: Inspection, Nanoimprint lithography, Metrology, Lithography, Process control, Scatterometry, Semiconducting wafers, Optical inspection, Scanning electron microscopy, Optical lithography

Proceedings Article | 21 March 2017 Presentation + Paper
Takuya Kono, Masayuki Hatano, Hiroshi Tokue, Kei Kobayashi, Masato Suzuki, Kazuya Fukuhara, Masafumi Asano, Tetsuro Nakasugi, Eun Hyuk Choi, Wooyung Jung
Proceedings Volume 10144, 1014406 (2017) https://doi.org/10.1117/12.2257951
KEYWORDS: Nanoimprint lithography, Overlay metrology, Lithography, Line edge roughness, Semiconductors, Critical dimension metrology, Nanotechnology, Semiconducting wafers, Optical lithography, Particles, Distortion, Optical alignment, Inspection

Proceedings Article | 8 March 2016 Paper
Masafumi Asano, Hirotaka Tsuda, Motofumi Komori, Kazuto Matsuki, Hideaki Abe, Woo-Yung Jung
Proceedings Volume 9778, 977820 (2016) https://doi.org/10.1117/12.2218994
KEYWORDS: Nanoimprint lithography, Critical dimension metrology, Process control, Scatterometry, Etching, Manufacturing, Photoresist processing, Metrology, Image processing, Lithography, Semiconducting wafers, Optical lithography, Control systems, Photomasks

SPIE Journal Paper | 19 December 2014
Matthew Sendelbach, Niv Sarig, Koichi Wakamoto, Hyang Kyun (Helen) Kim, Paul Isbester, Masafumi Asano, Kazuto Matsuki, Carmen Osorio, Chas Archie
JM3, Vol. 13, Issue 04, 041414, (December 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.041414
KEYWORDS: Metrology, Transmission electron microscopy, Statistical analysis, Semiconducting wafers, Error analysis, Manufacturing, Scatterometry, Semiconductors, Uncertainty analysis, Quality measurement

Showing 5 of 40 publications
Conference Committee Involvement (15)
Metrology, Inspection, and Process Control XXXVIII
26 February 2024 | San Jose, California, United States
Metrology, Inspection, and Process Control XXXVII
27 February 2023 | San Jose, California, United States
Metrology, Inspection, and Process Control XXXVI
25 April 2022 | San Jose, California, United States
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
22 February 2021 | Online Only, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXIV
24 February 2020 | San Jose, California, United States
Showing 5 of 15 Conference Committees
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