Masafumi Asano
Director at Tokyo Electron Ltd.
SPIE Involvement:
Conference Program Committee | Author
Publications (40)

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Lithography, Metrology, Optical lithography, Inspection, Scanning electron microscopy, Optical inspection, Scatterometry, Process control, Nanoimprint lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Semiconductors, Lithography, Metrology, Optical lithography, 3D modeling, Quality measurement, Scanning electron microscopy, Scatterometry, Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers, Scatter measurement

PROCEEDINGS ARTICLE | March 21, 2017
Proc. SPIE. 10144, Emerging Patterning Technologies
KEYWORDS: Semiconductors, Nanotechnology, Lithography, Optical lithography, Particles, Inspection, Distortion, Nanoimprint lithography, Optical alignment, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 8, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Metrology, Optical lithography, Etching, Image processing, Manufacturing, Control systems, Scatterometry, Process control, Photomasks, Nanoimprint lithography, Critical dimension metrology, Photoresist processing, Semiconducting wafers

SPIE Journal Paper | December 19, 2014
JM3 Vol. 13 Issue 04
KEYWORDS: Metrology, Transmission electron microscopy, Statistical analysis, Semiconducting wafers, Error analysis, Manufacturing, Scatterometry, Semiconductors, Uncertainty analysis, Quality measurement

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Semiconductors, Metrology, Statistical analysis, Calibration, Error analysis, Transmission electron microscopy, Scatterometry, Measurement devices, Semiconducting wafers, Statistical modeling

Showing 5 of 40 publications
Conference Committee Involvement (10)
Metrology, Inspection, and Process Control for Microlithography XXXIII
25 February 2019 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXII
26 February 2018 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXI
27 February 2017 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXX
22 February 2016 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXIX
23 February 2015 | San Jose, California, United States
Showing 5 of 10 published special sections
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