Masaharu Nishiguchi
at Dai Nippon Printing Co Ltd
SPIE Involvement:
Publications (15)

Proceedings Article | 9 July 2015 Paper
Masaharu Nishiguchi, Koichi Kanno, Hiroyuki Miyashita, Kana Ohara, Donghwan Son, Vikram Tolani, Masaki Satake
Proceedings Volume 9658, 96580W (2015)
KEYWORDS: Photomasks, Calibration, SRAF, Optical proximity correction, Semiconducting wafers, Deep ultraviolet, Lithography, Image analysis, Manufacturing, Resolution enhancement technologies

Proceedings Article | 28 July 2014 Paper
Masaharu Nishiguchi, Kouichi Kanno, Katsuya Hayano, Hideyoshi Takamizawa, Kana Ohara, Donghwan Son, Vikram Tolani
Proceedings Volume 9256, 925605 (2014)
KEYWORDS: Calibration, Photomasks, SRAF, Opacity, Optical proximity correction, Lithography, Critical dimension metrology, Deep ultraviolet, Metals, Semiconducting wafers

Proceedings Article | 6 December 2004 Paper
Proceedings Volume 5567, (2004)
KEYWORDS: Etching, Chromium, Plasma, Dry etching, Photoresist processing, Atomic force microscopy, Extreme ultraviolet lithography, Photomasks, Image processing, Diamond machining

Proceedings Article | 20 August 2004 Paper
Proceedings Volume 5446, (2004)
KEYWORDS: Etching, Atomic force microscopy, Chromium, Dry etching, Photoresist processing, Extreme ultraviolet lithography, Plasma, Scanning electron microscopy, Photomasks, Diamond machining

Proceedings Article | 17 December 2003 Paper
Proceedings Volume 5256, (2003)
KEYWORDS: Etching, Photomasks, Quartz, Semiconducting wafers, Transmittance, Signal processing, Silicon, Ions, Atomic force microscopy, Scanning electron microscopy

Showing 5 of 15 publications
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