Mr. Masaharu Nishiguchi Profile

Masaharu Nishiguchi

at Dai Nippon Printing Co Ltd

SPIE Involvement:

Author

Publications (15)

Proceedings Article | 9 July 2015 Paper

Improvements of AIMS D2DB matching for product patterns

Vikram Tolani, Masaharu Nishiguchi, Koichi Kanno, Hiroyuki Miyashita, Kana Ohara, Donghwan Son, Masaki Satake

Proceedings Volume 9658, 96580W (2015) https://doi.org/10.1117/12.2197609

KEYWORDS: Photomasks, Calibration, SRAF, Optical proximity correction, Semiconducting wafers, Deep ultraviolet, Lithography, Image analysis, Manufacturing, Resolution enhancement technologies

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Proceedings Article | 28 July 2014 Paper

Evaluation of AIMS D2DB simulation without calibration images

Kouichi Kanno, Katsuya Hayano, Hideyoshi Takamizawa, Kana Ohara, Donghwan Son, Vikram Tolani, Masaharu Nishiguchi

Proceedings Volume 9256, 925605 (2014) https://doi.org/10.1117/12.2070026

KEYWORDS: Calibration, Photomasks, SRAF, Opacity, Optical proximity correction, Lithography, Critical dimension metrology, Deep ultraviolet, Metals, Semiconducting wafers

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Proceedings Article | 6 December 2004 Paper

Evaluation of dry etching and defect repair of EUVL mask absorber layer

Toshiaki Motonaga, Tsuyoshi Amano, Shiho Sasaki, Tsukasa Abe, Masaharu Nishiguchi, Naoya Hayashi, Yuusuke Tanaka, Hiroshi Mohri, Iwao Nishiyama

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569397

KEYWORDS: Etching, Chromium, Plasma, Dry etching, Photoresist processing, Atomic force microscopy, Extreme ultraviolet lithography, Photomasks, Image processing, Diamond machining

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Proceedings Article | 20 August 2004 Paper

Study of mask process development for EUVL

Tsukasa Abe, Yuusuke Tanaka, Hiromasa Yamanashi, Iwao Nishiyama, Hiroshi Mohri, Naoya Hayashi, Masaharu Nishiguchi, Toshiaki Motonaga, Tsuyoshi Amano, Shiho Sasaki

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557817

KEYWORDS: Etching, Atomic force microscopy, Chromium, Dry etching, Photoresist processing, Extreme ultraviolet lithography, Plasma, Scanning electron microscopy, Photomasks, Diamond machining

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Proceedings Article | 17 December 2003 Paper

Photomask repair performance of the SiON/Ta-Hf attenuating PSM

Shiho Sasaki, Naoya Hayashi, Tsuyoshi Amano, Masaharu Nishiguchi, Yasutaka Morikawa

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518038

KEYWORDS: Etching, Photomasks, Quartz, Semiconducting wafers, Transmittance, Signal processing, Silicon, Ions, Atomic force microscopy, Scanning electron microscopy

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Proceedings Article | 17 December 2003 Paper

Advanced FIB mask repair technology for 90-nm/ArF lithography: III

Tatsuya Adachi, Masashi Muramatsu, Yasushi Satoh, Osamu Takaoka, Naoya Hayashi, Yoshiyuki Tanaka, Yasutoshi Itou, Yasuhiko Sugiyama, Yoshihiro Koyama, Masaharu Nishiguchi, Ryoji Hagiwara, Tomokazu Kozakai, Anto Yasaka, Masashi Shinohara, Hiroshi Sawaragi, Toshio Doi, Osamu Matsuda, Yasutaka Morikawa, Mamoru Okabe, Kazuo Aita, Katsumi Suzuki, Nobuyuki Yoshioka

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518026

KEYWORDS: Printing, Photomasks, Binary data, Image processing, Lithography, Ions, Opacity, Transmittance, Imaging systems, Surface conduction electron emitter displays

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Proceedings Article | 17 December 2003 Paper

Optimization of nanomachining repair condition for ArF lithography

Masaharu Nishiguchi, Yasutaka Morikawa, Lee Terrill, Naoya Hayashi, Hiroyuki Hashimoto, Tsuyoshi Amano, Ron Bozak, Roy White

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518025

KEYWORDS: Binary data, Photomasks, Semiconducting wafers, Lithography, 193nm lithography, Cadmium, Quartz, Scanning electron microscopy, NOx, Printing

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Proceedings Article | 28 August 2003 Paper

Defect repair performance using the nanomachining repair technique

Roy White, Lee Terrill, Haruo Kokubo, Ron Bozak, Naoya Hayashi, Masaharu Nishiguchi, Yasutaka Morikawa

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504213

KEYWORDS: Quartz, Scanning electron microscopy, Photomasks, Binary data, Printing, Bridges, Cadmium, Image transmission, 193nm lithography, Manufacturing

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Proceedings Article | 28 August 2003 Paper

Advanced FIB mask repair technology for 100-nm/ArF lithography: II

Toshiya Ozawa, Osamu Takaoka, Tatsuya Adachi, Shoji Shinohara, Masashi Muramatsu, Naoya Hayashi, Katsumi Suzuki, Masaharu Nishiguchi, Osamu Matsuda, Yasushi Sato, Masakatsu Hasuda, Nobuyuki Yoshioka, Toshio Doi, Tomokazu Kozakai, Ryoji Hagiwara, Yasutaka Morikawa, Mamoru Okabe, Yasuhiko Sugiyama, Anto Yasaka, Yoshihiro Tanaka, Kazuo Aita, Yoshihiro Koyama

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504212

KEYWORDS: Printing, Photomasks, Binary data, Lithography, Semiconducting wafers, Imaging systems, Opacity, Ions, Scanners, Transmittance

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Proceedings Article | 27 December 2002 Paper

Defect printability analysis on alternating phase-shifting masks for 193-nm lithography

Linyong Pang, Yasutaka Morikawa, Morihisa Hoga, Yousuke Totsu, Gerard Luk-Pat, Masaharu Nishiguchi, Naoya Hayashi

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468210

KEYWORDS: Inspection, Semiconducting wafers, Photomasks, Lithography, Quartz, Dry etching, Etching, Phase shifts, Chromium, Computer simulations

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Proceedings Article | 27 December 2002 Paper

Feasibility study of detectability and printability for TaSiOx

Kenji Noguchi, Shiho Sasaki, Hiroshi Mohri, Yasutaka Morikawa, Toshiaki Motonaga, Naoya Hayashi, Masaharu Nishiguchi, Morihisa Hoga

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468201

KEYWORDS: Inspection, Photomasks, Lithography, Photomask technology, Phase shifting, Quartz, Dry etching, Etching, Defect detection

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Proceedings Article | 27 December 2002 Paper

Advanced FIB mask repair technology for 100-nm/ArF lithography

Yasutaka Morikawa, Kazuo Aita, Ryoji Hagiwara, Tomokazu Kozakai, Nobuyuki Yoshioka, Masaharu Nishiguchi, Anto Yasaka, Yasushi Sato, Mamoru Okabe, Hiroshi Sawaragi, Katsumi Suzuki, Naoya Hayashi, Masakatsu Hasuda, Tatsuya Adachi, Yoshihiro Koyama, Toshiya Ozawa, Osamu Takaoka, Masashi Muramatsu, Toshio Doi, Yasuhiko Sugiyama, Yoshihiro Tanaka, Shoji Shinohara

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467357

KEYWORDS: Photomasks, Binary data, Transmittance, Lithography, Opacity, Ions, Atomic force microscopy, Imaging systems, Image processing, Data modeling

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Proceedings Article | 16 August 2002 Paper

Feasibility study of manufacturing process and quality control for the new alternating PSM structure

Masami Nara, Morihisa Hoga, Haruo Kokubo, Yasutaka Morikawa, Masaharu Nishiguchi, Naoya Hayashi, Yousuke Totsu

Proceedings Volume 4764, (2002) https://doi.org/10.1117/12.479337

KEYWORDS: Quartz, Inspection, Process control, Optical alignment, Etching, Cadmium, Binary data, Reticles, Manufacturing, Photomasks

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Proceedings Article | 1 August 2002 Paper

Defect printability analysis on alternating phase-shifting masks

Masaharu Nishiguchi, Naoya Hayashi, Linyong Pang, Kevin Chan, Yasutaka Morikawa, Qi-De Qian

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476975

KEYWORDS: Photomasks, Inspection, Phase shifts, Semiconducting wafers, Virtual reality, Defect inspection, Cadmium sulfide, Manufacturing, Quartz, Wavefronts

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Proceedings Article | 11 March 2002 Paper

Feasibility study of manufacturing process and quality control for the new alternating PSM structure

Yasutaka Morikawa, Morihisa Hoga, Haruo Kokubo, Masaharu Nishiguchi, Naoya Hayashi, Yousuke Totsu, Masami Nara

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458278

KEYWORDS: Quartz, Inspection, Optical alignment, Binary data, Process control, Reticles, Etching, Cadmium, Manufacturing, Semiconducting wafers

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Showing 5 of 15 publications

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