Masahiko Okumura
at Nikon Corp
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 10 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Optical lithography, Lithographic illumination, Modulation, Zernike polynomials, Photomasks, Double patterning technology, Immersion lithography, Source mask optimization, Resolution enhancement technologies, Fiber optic illuminators

Proceedings Article | 7 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Imaging systems, Sensors, Calibration, Scanners, Manufacturing, Control systems, Lens design, Immersion lithography, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 21 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Polarization, Imaging systems, Calibration, Water, Scanners, Wavefronts, Projection systems, Resonance energy transfer, Semiconducting wafers

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