Dr. Masahiro Hashimoto Profile

Dr. Masahiro Hashimoto

Senior Director at HOYA Corp

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Author

Publications (22)

SPIE Journal Paper | 28 October 2021

Multi-beam mask writer exposure optimization for EUV mask stacks

Peter Hudek, Michal Jurkovic, Pavlina Choleva, Witold Wroczewski, Masahiro Hashimoto, Kazunori Ono, Toru Fukui, Toshiya Takahashi, Kotaro Takahashi

JM3, Vol. 20, Issue 04, 041402, (October 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.4.041402

KEYWORDS: Photomasks, Extreme ultraviolet, Point spread functions, Photoresist processing, Extreme ultraviolet lithography, Scattering, Monte Carlo methods, Lithography, Electron beam lithography, Backscatter

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Proceedings Article | 12 October 2021 Presentation + Paper

Precision phase angle control with transmissive etching stop film

Hiroaki Shishido, Osamu Nozawa, Ryo Ohkubo, Hitoshi Maeda, Masahiro Hashimoto

Proceedings Volume 11855, 118550O (2021) https://doi.org/10.1117/12.2600852

KEYWORDS: Etching, Silica, Transmission electron microscopy

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Proceedings Article | 22 February 2021 Presentation

MBMW exposure optimization for EUV mask stacks

Peter Hudek, Michal Jurkovic, Pavlina Choleva, Witold Wroczewski, Masahiro Hashimoto, Kazunori Ono, Toru Fukui, Toshiya Takahashi, Kotaro Takahashi

Proceedings Volume 11610, 116100T (2021) https://doi.org/10.1117/12.2584588

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Scattering, Point spread functions, Photoresist processing, Numerical simulations, Lithography, Chemically amplified resists

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EUV Lithography makes substantial progress in optimizing (i) tool, (ii) mask blanks, and (iii) resist materials to support the next generation EUV imaging performance. Novel EUV masks use a variety of absorbers and capping layers fabricated on mirroring multilayer stacks coated on ULE substrate. 50 keV electron multi-beams are used to write high-resolution patterns in an appropriate resist coated over the absorber layer stack. The main goal of multi-beam mask writing (MBMW) has been the precise geometry control and faithful reproduction of the intended pattern on the substrate. The highly conform MBMW resist-patterning process needs to understand the absorbed intensity distribution from the electron scattering in the resist/substrate stack, as well as the consecutive radiation-chemical effects induced by the electron energy spread together with the nonlinear dissolution behavior of the resist. It is difficult to exactly calculate the relative contribution of these factors separately, but their overall effect can be modeled by the analytic 'point spread' response function (PSF) for the resist. The ultimate resolution is determined by the amount of laterally- and back-scattered electrons from specific target compositions. These interaction events cause proximity, fogging, local heating, and surface charging effects, defining the accurate pattern. Simulations have shown alterations in the absorbed energy distributions of EUV masks with different stacks, and the experiments approved the results from the calculations. We present results of resist response to the electron multi-beam exposure based on statistical numerical simulation on different EUV-stacks directly compared with the corresponding numerical lithographic parameters extracted from the experimental resist screening. Consequently, all input parameters for MBMW writing corrections were precisely specified to the corresponding absorbed energy distribution signature of the concrete EUV mask. The experiments were performed with the IMS MBMW-101 ALPHA tool in a high dose positive-tone chemically amplified resist (pCAR), provided by FUJIFILM, and coated on experimental EUV masks containing different novel stack compositions as prepared at HOYA Corporation.

Proceedings Article | 29 August 2019 Paper

Continuous challenges for next era of lithography

Takahiro Hiromatsu, Ryo Ohkubo, Hitoshi Maeda, Toru Fukui, Hiroaki Shishido, Kazunori Ono, Masahiro Hashimoto

Proceedings Volume 11177, 1117705 (2019) https://doi.org/10.1117/12.2534910

KEYWORDS: Extreme ultraviolet, Nanoimprint lithography, Binary data, Semiconducting wafers

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Proceedings Article | 27 March 2014 Paper

SRAF window improvement with under-coating layer

Takahiro Hiromatsu, Toru Fukui, Kenta Tsukagoshi, Kazunori Ono, Masahiro Hashimoto

Proceedings Volume 9051, 905120 (2014) https://doi.org/10.1117/12.2046779

KEYWORDS: SRAF, Chromium, Photomasks, Etching, Photoresist processing, Optical lithography, Coating, Absorption, Liquids, Line edge roughness

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Proceedings Article | 27 March 2014 Paper

Reduction of image placement error on photomask-making for multiple patterning

Takahiro Hiromatsu, Toru Fukui, Kenta Tsukagoshi, Kazunori Ono, Masahiro Hashimoto

Proceedings Volume 9051, 90510U (2014) https://doi.org/10.1117/12.2046777

KEYWORDS: Diffusion, Electron beam lithography, Coating, Electron beams, Photomasks, Photoresist processing, Chemically amplified resists, Radon, Lithography, Ions

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Proceedings Article | 29 September 2010 Paper

Advanced binary film for 193nm lithography extension to sub-32-nm node

Osamu Nozawa, Hiroaki Shishido, Masahiro Hashimoto, Yasushi Ohkubo, Hideaki Mitsui

Proceedings Volume 7823, 78230K (2010) https://doi.org/10.1117/12.866006

KEYWORDS: Photomasks, Tantalum, Reflectivity, Critical dimension metrology, Silicon, Etching, Binary data, Oxides, Chromium, Scanning transmission electron microscopy

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Proceedings Article | 11 May 2009 Paper

The art of photomask materials for low-k1-193nm lithography

Masahiro Hashimoto, Hiroyuki Iwashita, Hideaki Mitsui

Proceedings Volume 7379, 73791Q (2009) https://doi.org/10.1117/12.830600

KEYWORDS: Etching, Photomasks, Photoresist processing, Lithography, Optical lithography, Image processing, Silicon, Binary data, Resolution enhancement technologies, Lithographic illumination

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SPIE Journal Paper | 1 April 2009

Hyper-thin resist system for photomask-making in double-patterning generation

Masahiro Hashimoto, Hideaki Mitsui

JM3, Vol. 8, Issue 02, 023001, (April 2009) https://doi.org/10.1117/12.10.1117/1.3116127

KEYWORDS: Chromium, Etching, Line edge roughness, Double patterning technology, Photomasks, Photoresist processing, Image registration, Lithography, Scanning electron microscopy, Inspection

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Proceedings Article | 19 May 2008 Paper

Photomask technology for 32nm node and beyond

Ryugo Hikichi, Hiroyuki Ishii, Hidekazu Migita, Noriko Kakehi, Mochihiro Shimizu, Hideyoshi Takamizawa, Tsugumi Nagano, Masahiro Hashimoto, Hiroyuki Iwashita, Toshiyuki Suzuki, Morio Hosoya, Yasushi Ohkubo, Masao Ushida, Hideaki Mitsui

Proceedings Volume 7028, 702805 (2008) https://doi.org/10.1117/12.793014

KEYWORDS: Chromium, Photomasks, Etching, Binary data, Image processing, Photoresist processing, Photomask technology, Lithography, Multilayers, Absorbance

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Proceedings Article | 19 May 2008 Paper

The ultimate chrome absorber in photomask making

Masahiro Hashimoto, Hiroyuki Iwashita, Atsushi Kominato, Hiroaki Shishido, Masao Ushida, Hideaki Mitsui

Proceedings Volume 7028, 702804 (2008) https://doi.org/10.1117/12.793013

KEYWORDS: Chromium, Etching, Photomasks, SRAF, Lithography, Thin films, Absorbance, Image processing, Oxidation

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Proceedings Article | 15 May 2007 Paper

Novel glass inspection method for advanced photomask blanks

Masaru Tanabe, Toshiharu Kikuchi, Masahiro Hashimoto, Yasushi Ohkubo

Proceedings Volume 6607, 66072H (2007) https://doi.org/10.1117/12.729000

KEYWORDS: Inspection, Transmittance, Semiconducting wafers, Photomasks, Glasses, Printing, Reflection, Defect detection, Luminescence, Quartz

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Proceedings Article | 20 October 2006 Paper

Multi-layer resist system for 45-nm-node and beyond: Part II

Yukihiro Fujimura, Jumpei Morimoto, Asuka Manoshiro, Mochihiro Shimizu, Hideyoshi Takamizawa, Masahiro Hashimoto, Hiroshi Shiratori, Katsuhiko Horii, Yasunori Yokoya, Yasushi Ohkubo, Tomoyuki Enomoto, Takahiro Sakaguchi, Masaki Nagai

Proceedings Volume 6349, 634936 (2006) https://doi.org/10.1117/12.692896

KEYWORDS: Etching, Dry etching, Resistance, Photoresist processing, Coating, Photomasks, Chromium, Fluorine, Ultraviolet radiation, Scanning electron microscopy

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Proceedings Article | 20 October 2006 Paper

Multi-layer resist system for 45-nm-node and beyond: part I

M. Hashimoto, H. Shiratori, K. Horii, Y. Yokoya, Y. Ohkubo, H. Takamizawa, Y. Fujimura, J. Morimoto, A. Manoshiro, M. Shimizu, T. Yokoyama, T. Enomoto, M. Nagai

Proceedings Volume 6349, 63490I (2006) https://doi.org/10.1117/12.693131

KEYWORDS: Etching, Chromium, Photoresist processing, SRAF, Diffusion, Scanning electron microscopy, Standards development, Chemically amplified resists, Photomasks, Optical lithography

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Proceedings Article | 6 December 2004 Paper

Development of new chrome blanks for 65-nm node and beyond

Masahiro Hashimoto, Takeyuki Yamada, Minoru Sakamoto, Mutsumi Hara, Yasushi Ohkubo, Masao Ushida

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.580776

KEYWORDS: Etching, Reticles, Chromium, Image processing, Fabrication, Resolution enhancement technologies, Vestigial sideband modulation, Scanning electron microscopy, Photoresist processing, Photomasks

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Proceedings Article | 28 August 2003 Paper

CAR blanks performance for advanced reticle fabrication

Masahiro Hashimoto, Yasunori Yokoya, Takao Higuchi, Fumiko Ohta, Shouichi Kawashima, Yasushi Ohkubo

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504183

KEYWORDS: Reflectivity, Coating, Deep ultraviolet, Reticles, Critical dimension metrology, Line edge roughness, Tolerancing, Laser systems engineering, Optical lithography, Laser applications

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Proceedings Article | 1 August 2002 Paper

NEGATIVE-CAR blanks feasibility study results for EB reticle fabrication beyond 100 nm node

Fumiko Ota, Masahiro Hashimoto, Keishi Asakawa, Takao Higuchi, Yasunori Yokoya

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476945

KEYWORDS: Coating, Reticles, Photoresist processing, Scanning electron microscopy, Critical dimension metrology, Compact discs, Opacity, Photomasks, Image resolution, Standards development

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Proceedings Article | 11 March 2002 Paper

CARs blanks feasibility study results for the advanced EB reticle fabrication (IV)

Masahiro Hashimoto, Fumiko Ota, Yasunori Yokoya, Hideo Kobayashi

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458350

KEYWORDS: Compact discs, Reticles, Particle contamination, Packaging, Photomasks, Standards development, Photomask technology, Chemically amplified resists, Ions, Coating

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Proceedings Article | 5 September 2001 Paper

CARs blanks feasibility study results for advanced EB reticle fabrication: III

Masahiro Hashimoto, Fumiko Ohta, Yasunori Yokoya, Hideo Kobayashi

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438379

KEYWORDS: Packaging, Compact discs, Resolution enhancement technologies, Coating, Humidity, Reticles, Optical isolators, Particle contamination, Scanning electron microscopy, Photomasks

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Proceedings Article | 22 January 2001 Paper

CARs blanks feasibility study results for advanced EB reticle fabrication

Masahiro Hashimoto, Hideo Kobayashi, Yasunori Yokoya

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410738

KEYWORDS: Compact discs, Coating, Reticles, Standards development, Photomasks, Scanning electron microscopy, Cerium, Optical lithography, Environmental sensing, Etching

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Proceedings Article | 19 July 2000 Paper

CAR blanks feasibility study results

Yasunori Yokoya, Hideo Kobayashi, Masahiro Hashimoto, Fumiko Ota, Keishi Asakawa

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392064

KEYWORDS: Compact discs, Reticles, Coating, Dry etching, Wet etching, Chemically amplified resists, Electron beam lithography, Optical lithography, Edge roughness, Motion analysis

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Proceedings Article | 3 February 2000 Paper

CAR blanks feasibility study results

Yasunori Yokoya, Hideo Kobayashi, Takao Higuchi, Keishi Asakawa, Akinori Kurikawa, Tadashi Sakurai, Masahiro Hashimoto, Fumiko Ota

Proceedings Volume 3996, (2000) https://doi.org/10.1117/12.377099

KEYWORDS: Contamination, Humidity, Compact discs, Scanning electron microscopy, Chemically amplified resists, Coating, Reticles, Electron beam lithography, Photomasks, Photoresist processing

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Showing 5 of 22 publications

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