Dr. Masahiro Hashimoto
Senior Director at HOYA Corp
SPIE Involvement:
Author
Publications (20)

Proceedings Article | 22 February 2021 Presentation
Proc. SPIE. 11610, Novel Patterning Technologies 2021
KEYWORDS: Lithography, Point spread functions, Scattering, Numerical simulations, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Chemically amplified resists

Proceedings Article | 29 August 2019 Paper
Proc. SPIE. 11177, 35th European Mask and Lithography Conference (EMLC 2019)
KEYWORDS: Extreme ultraviolet, Nanoimprint lithography, Semiconducting wafers, Binary data

Proceedings Article | 27 March 2014 Paper
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Optical lithography, Etching, Coating, Chromium, Photomasks, SRAF, Line edge roughness, Photoresist processing, Liquids, Absorption

Proceedings Article | 27 March 2014 Paper
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Radon, Ions, Diffusion, Coating, Photomasks, Photoresist processing, Chemically amplified resists

Proceedings Article | 29 September 2010 Paper
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Oxides, Etching, Silicon, Reflectivity, Chromium, Photomasks, Critical dimension metrology, Tantalum, Binary data, Scanning transmission electron microscopy

Showing 5 of 20 publications
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