Dr. Masahiro Hashimoto
at HOYA Corp
SPIE Involvement:
Author
Publications (19)

Proceedings Article | 29 August 2019
Proc. SPIE. 11177, 35th European Mask and Lithography Conference (EMLC 2019)
KEYWORDS: Extreme ultraviolet, Nanoimprint lithography, Semiconducting wafers, Binary data

Proceedings Article | 27 March 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Radon, Ions, Diffusion, Coating, Photomasks, Photoresist processing, Chemically amplified resists

Proceedings Article | 27 March 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Optical lithography, Etching, Coating, Chromium, Photomasks, SRAF, Line edge roughness, Photoresist processing, Liquids, Absorption

Proceedings Article | 29 September 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Oxides, Etching, Silicon, Reflectivity, Chromium, Photomasks, Critical dimension metrology, Tantalum, Binary data, Scanning transmission electron microscopy

Proceedings Article | 11 May 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Etching, Image processing, Silicon, Photomasks, Photoresist processing, Binary data, Resolution enhancement technologies

Showing 5 of 19 publications
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