Masahiro Shoji
Sales Representative at Nippon Control System Corp
SPIE Involvement:
Author
Publications (21)

PROCEEDINGS ARTICLE | September 25, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Lithography, Modulation, Scattering, Chemical species, Molecules, Laser scattering, Parallel processing, Photomasks, Convolution, Critical dimension metrology

PROCEEDINGS ARTICLE | September 25, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Logic, Manufacturing, Inspection, Diagnostics, Parallel processing, Image transmission, Photomasks, Extreme ultraviolet, System integration, Vestigial sideband modulation

PROCEEDINGS ARTICLE | May 25, 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Logic, Inspection, Scanning electron microscopy, Software development, Photomasks, Optical proximity correction, Mask making, Analytical research, Data conversion, Vestigial sideband modulation

PROCEEDINGS ARTICLE | April 3, 2010
Proc. SPIE. 7641, Design for Manufacturability through Design-Process Integration IV
KEYWORDS: Electronics, Manufacturing, Inspection, Data processing, Software development, Photomasks, Optical proximity correction, Analytical research, Data conversion, Vestigial sideband modulation

PROCEEDINGS ARTICLE | April 2, 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Electron beam lithography, Electron beams, Scattering, Calibration, Hydrogen, Laser scattering, Analytical research, Critical dimension metrology, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | September 23, 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Electron beams, Electronics, Metals, Manufacturing, Inspection, Software development, Photomasks, Optical proximity correction, System on a chip, Vestigial sideband modulation

Showing 5 of 21 publications
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