Masahiro Tamura
at Canon Inc
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 9 April 2024 Presentation + Paper
Makoto Ogusu, Masahiro Tamura, Yu Nomura, Tomohiro Saito, Hideki Kunugi, Tomohito Yamaji, Fumiaki Tanaka, Takahiro Abe
Proceedings Volume 12956, 1295604 (2024) https://doi.org/10.1117/12.3012453
KEYWORDS: Nanoimprint lithography, Optical lithography, Molybdenum, Etching, Semiconducting wafers, Overlay metrology, Lithography, Line width roughness, Optical components

Proceedings Article | 29 September 2023 Paper
Go Tsuchiya, Makoto Ogusu, Masaki Ishida, Masahiro Tamura, Keita Sakai, Toshiki Ito, Yuto Ito, Isao Kawata, Hideki Kunugi, Shuhei Tamura, Ryuichi Asako, Keisuke Tanaka, Tomohito Yamaji
Proceedings Volume 12915, 1291506 (2023) https://doi.org/10.1117/12.2684487
KEYWORDS: Nanoimprint lithography, Etching, Line width roughness, Optical lithography, Semiconducting wafers, Critical dimension metrology, Overlay metrology, Printing, Optical alignment, Distortion

Proceedings Article | 1 May 2023 Presentation + Paper
Proceedings Volume 12497, 1249709 (2023) https://doi.org/10.1117/12.2658125
KEYWORDS: Nanoimprint lithography, Etching, Line width roughness, Optical lithography, Semiconducting wafers, Critical dimension metrology, Overlay metrology, Printing, Optical alignment, Distortion

Proceedings Article | 25 May 2022 Presentation + Paper
Proceedings Volume 12054, 1205405 (2022) https://doi.org/10.1117/12.2615934
KEYWORDS: Nanoimprint lithography, Etching, Line width roughness, Critical dimension metrology, Overlay metrology

Proceedings Article | 22 February 2021 Presentation + Paper
Proceedings Volume 11610, 1161007 (2021) https://doi.org/10.1117/12.2584720
KEYWORDS: Nanoimprint lithography, Manufacturing, Computational lithography, Semiconductors, Semiconductor manufacturing, Optical lithography, Semiconducting wafers, Photomasks, Ultraviolet radiation, Physics

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