Masahiro Yamamoto
at Tokyo Electron America Inc
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 25, 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Refractive index, Data modeling, Optical properties, Dielectrics, Scatterometry, Semiconductor manufacturing, Critical dimension metrology, Semiconducting wafers, Scatter measurement, Process modeling

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Lithography, Metrology, Scanners, Reliability, Lamps, Scatterometry, Process control, Critical dimension metrology, Semiconducting wafers, Temperature metrology

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