Mr. Masakatsu Ota
at Canon Inc
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Curium, Calcium, Computer simulations, Scanning electron microscopy, Printing, Photomasks, Optical proximity correction, Semiconducting wafers, Model-based design, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 7, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Cadmium, Scattering, Fourier transforms, Image transmission, Photomasks, Image enhancement, Source mask optimization, Optical proximity correction, Critical dimension metrology, Resolution enhancement technologies

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