Dr. Endo Masakazu Profile

Dr. Endo Masakazu

Assistant Manager at Hitachi High-Tech Science Corp

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Author

Publications (11)

Proceedings Article | 3 April 2010 Paper

Development of a design intent extraction flow for mask manufacturing

Kokoro Kato, Masakazu Endo, Tadao Inoue, Masaki Yamabe

Proc. SPIE. 7641, Design for Manufacturability through Design-Process Integration IV

KEYWORDS: Semiconductors, Manufacturing, Inspection, Design for manufacturing, Photomasks, Optical proximity correction, Analog electronics, Electronic design automation, Defect inspection, Design for manufacturability

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Proceedings Article | 23 September 2009 Paper

Mask data prioritization based on design intent - II

Masakazu Endo, Kokoro Kato, Tadao Inoue, Masaki Yamabe

Proc. SPIE. 7488, Photomask Technology 2009

KEYWORDS: Metals, Manufacturing, Inspection, Data processing, Design for manufacturing, Photomasks, Optical proximity correction, Data conversion, Electronic design automation, Defect inspection

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Proceedings Article | 11 May 2009 Paper

Utilization of design intent information for mask manufacturing (II)

Kokoro Kato, Masakazu Endo, Tadao Inoue, Masaki Yamabe

Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI

KEYWORDS: Semiconductors, Manufacturing, Inspection, Data processing, Design for manufacturing, Photomasks, Data conversion, Analog electronics, Electronic design automation, Design for manufacturability

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Proceedings Article | 17 October 2008 Paper

Mask data prioritization based on design intent

Kokoro Kato, Masakazu Endo, Tadao Inoue, Masaki Yamabe

Proc. SPIE. 7122, Photomask Technology 2008

KEYWORDS: Semiconductors, Reticles, Manufacturing, Inspection, Data processing, Design for manufacturing, Photomasks, Data conversion, Semiconducting wafers, Design for manufacturability

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Proceedings Article | 19 May 2008 Paper

Comparison of verification methods for OASIS files: hierarchical or flat?

Kokoro Kato, Yoshiyuki Taniguchi, Masakazu Endo, Kuninori Nishizawa, Tadao Inoue, Toshiaki Fujii

Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV

KEYWORDS: Nanotechnology, Data modeling, Error analysis, Parallel processing, Data processing, Photomasks, Explosives, Optical proximity correction, Data conversion, Standards development

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Proceedings Article | 19 May 2008 Paper

Utilization of design intent information for mask manufacturing

Kokoro Kato, Masakazu Endo, Tadao Inoue, Masaki Yamabe

Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV

KEYWORDS: Semiconductors, Databases, Metals, Manufacturing, Inspection, Design for manufacturing, Photomasks, Data conversion, Electronic filtering, Design for manufacturability

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Proceedings Article | 2 May 2008 Paper

Mask data rank (MDR) and its application

Kokoro Kato, Masakazu Endo, Tadao Inoue, Masaki Yamabe

Proc. SPIE. 6792, 24th European Mask and Lithography Conference

KEYWORDS: Semiconductors, Reticles, Metals, Manufacturing, Inspection, Design for manufacturing, Photomasks, Data conversion, Electronic filtering, Design for manufacturability

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Proceedings Article | 1 November 2007 Paper

Mask rule check using priority information of mask patterns

Kokoro Kato, Yoshiyuki Taniguchi, Kuninori Nishizawa, Masakazu Endo, Tadao Inoue, Ryouji Hagiwara, Anto Yasaka

Proc. SPIE. 6730, Photomask Technology 2007

KEYWORDS: Error analysis, Manufacturing, Inspection, Software development, Design for manufacturing, Photomasks, Optical proximity correction, SRAF, Data conversion, Design for manufacturability

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Proceedings Article | 15 May 2007 Paper

Fast file size estimation of mask data conversion from OASIS to GDS2

Masakazu Endo, Yoshiyuki Taniguchi, Kuninori Nishizawa, Kokoro Kato

Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV

KEYWORDS: Nanotechnology, Data compression, Error analysis, Data processing, Photomasks, Data conversion, Electronic design automation, Standards development, Data analysis

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Proceedings Article | 20 May 2006 Paper

From GDSII to OASIS: practical support tools for data processing flow transition

Masakazu Endo, Kuninori Nishizawa, Kokoro Kato

Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII

KEYWORDS: Nanotechnology, Data compression, Data processing, Software development, Photomasks, Optical proximity correction, Data conversion, Electronic design automation, Standards development, Vestigial sideband modulation

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Proceedings Article | 28 June 2005 Paper

Effective IP protection method of mask data using OASIS format

Kuninori Nishizawa, Masakazu Endo, Kokoro Kato

Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII

KEYWORDS: Image compression, Data storage, Image processing, Parallel processing, Control systems, Process control, Photomasks, Local area networks, Algorithm development, Intellectual property

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Showing 5 of 11 publications

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