Masakazu Hamaji
at Nippon Control System Corp
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Lithography, Photomasks, Optical proximity correction, SRAF, Mask making, Process modeling

PROCEEDINGS ARTICLE | October 4, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Photovoltaics, Modulation, Metals, Control systems, Photomasks, Beam shaping, Source mask optimization, Optical proximity correction, SRAF, Semiconducting wafers

PROCEEDINGS ARTICLE | October 8, 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Lithography, Modulation, Ions, Control systems, Data processing, Photomasks, Optical proximity correction, Model-based design, Vestigial sideband modulation, Resolution enhancement technologies

PROCEEDINGS ARTICLE | September 9, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Lithography, Detection and tracking algorithms, Modulation, Computer simulations, Photomasks, SRAF, Algorithm development, Model-based design, Vestigial sideband modulation, Resolution enhancement technologies

PROCEEDINGS ARTICLE | September 25, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Data storage, Databases, Nondestructive evaluation, Control systems, Distributed computing, Data conversion, Data communications, Photomask technology, Data storage servers, Current controlled current source

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top