Masakazu Hamaji
Manager at Nippon Control System Corp
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 3 October 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Calibration, Etching, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Mask making, Critical dimension metrology

Proceedings Article | 16 October 2017
Proc. SPIE. 10451, Photomask Technology 2017
KEYWORDS: Lithography, Photomasks, Optical proximity correction, SRAF, Mask making, Process modeling

Proceedings Article | 4 October 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Photovoltaics, Modulation, Metals, Control systems, Photomasks, Beam shaping, Source mask optimization, Optical proximity correction, SRAF, Semiconducting wafers

Proceedings Article | 8 October 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Lithography, Modulation, Ions, Control systems, Data processing, Photomasks, Optical proximity correction, Model-based design, Vestigial sideband modulation, Resolution enhancement technologies

Proceedings Article | 9 September 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Lithography, Detection and tracking algorithms, Modulation, Computer simulations, Photomasks, SRAF, Algorithm development, Model-based design, Vestigial sideband modulation, Resolution enhancement technologies

Showing 5 of 6 publications
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