Mr. Masakazu Sanada
at Dainippon Screen Manufacturing Co Ltd
SPIE Involvement:
Author
Publications (15)

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Carbon, Particles, Dielectrics, Coating, Chemical vapor deposition, Immersion lithography, Thin film coatings, System integration, Semiconducting wafers, Edge roughness

PROCEEDINGS ARTICLE | April 16, 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Lithography, Contamination, Scanners, Particles, Coating, Inspection, Printing, Semiconductor manufacturing, Immersion lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | March 24, 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Lithography, Diffractive optical elements, Particles, Silicon, Coating, Inspection, Scanning electron microscopy, Immersion lithography, Thin film coatings, Semiconducting wafers

PROCEEDINGS ARTICLE | March 23, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Optical lithography, Scanners, Electroluminescence, Scanning electron microscopy, Finite element methods, Line width roughness, Immersion lithography, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Particles, Interfaces, Silicon, Digital watermarking, Solids, Immersion lithography, Convection, Liquid lenses, Thermodynamics, Liquids

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Etching, Interfaces, Light scattering, Manufacturing, Immersion lithography, Plating, Photoresist processing, Thermodynamics, Lawrencium, Liquids

Showing 5 of 15 publications
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