Masakazu Sanada
at Dainippon Screen Manufacturing Co Ltd
SPIE Involvement:
Author
Publications (15)

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Semiconducting wafers, Immersion lithography, Particles, Thin film coatings, System integration, Coating, Chemical vapor deposition, Dielectrics, Carbon, Edge roughness

PROCEEDINGS ARTICLE | April 16, 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Semiconducting wafers, Particles, Printing, Inspection, Immersion lithography, Coating, Scanners, Lithography, Contamination, Semiconductor manufacturing

PROCEEDINGS ARTICLE | March 24, 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Semiconducting wafers, Particles, Lithography, Coating, Diffractive optical elements, Immersion lithography, Thin film coatings, Inspection, Silicon, Scanning electron microscopy

PROCEEDINGS ARTICLE | March 23, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Line width roughness, Electroluminescence, Semiconducting wafers, Lithography, Immersion lithography, Finite element methods, Photoresist processing, Scanners, Scanning electron microscopy, Optical lithography

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Digital watermarking, Particles, Silicon, Liquids, Immersion lithography, Solids, Thermodynamics, Liquid lenses, Convection, Interfaces

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Interfaces, Liquids, Manufacturing, Thermodynamics, Immersion lithography, Lawrencium, Plating, Photoresist processing, Etching, Light scattering

Showing 5 of 15 publications
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