Masakazu Tokita
at NuFlare Technology Inc
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | May 25, 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Defect detection, Databases, Inspection, Image sensors, Image transmission, Photomasks, Source mask optimization, Data conversion, Semiconducting wafers

PROCEEDINGS ARTICLE | April 16, 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Semiconductors, Defect detection, Databases, Inspection, Computer simulations, Photomasks, Source mask optimization, Optical proximity correction, Data conversion, Defect inspection

PROCEEDINGS ARTICLE | September 23, 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Lithography, Defect detection, Sensors, Inspection, Optical inspection, Telecommunications, Image transmission, Photomasks, SRAF, Semiconducting wafers

PROCEEDINGS ARTICLE | September 23, 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Wafer-level optics, Lithography, Sensors, Scanners, Inspection, Image resolution, Optical inspection, Printing, Photomasks, Semiconducting wafers

PROCEEDINGS ARTICLE | May 11, 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Wafer-level optics, Lithography, Defect detection, Sensors, Scanners, Inspection, Image resolution, Optical inspection, Photomasks, Semiconducting wafers

PROCEEDINGS ARTICLE | May 11, 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Defect detection, Image processing, Interfaces, Inspection, Image sensors, Data processing, Photomasks, Analytical research, Semiconducting wafers, Defect inspection

Showing 5 of 8 publications
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