Masaki Satake
at KLA Japan
SPIE Involvement:
Author
Publications (28)

Proceedings Article | 26 October 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Defect detection, Inspection, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness

Proceedings Article | 9 July 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Lithography, Deep ultraviolet, Calibration, Manufacturing, Image analysis, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 1 October 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Diffraction, Multilayers, Finite-difference time-domain method, Contamination, Calibration, 3D modeling, Photomasks, Extreme ultraviolet, Critical dimension metrology, Double positive medium

Proceedings Article | 20 September 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Carbon, Reflectors, Multilayers, Calibration, Atomic force microscopy, Transmission electron microscopy, Photomasks, Extreme ultraviolet, Semiconducting wafers, Double positive medium

Proceedings Article | 9 September 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Contamination, Defect detection, Air contamination, Scanners, Particles, Inspection, Photomasks, Image classification, Resolution enhancement technologies, Defect inspection

Proceedings Article | 28 June 2013
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Data modeling, Calibration, Inspection, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Double positive medium

Showing 5 of 28 publications
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