Masami Ikota
Special Assistant at Hitachi High-Tech Science Corp
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Author
Publications (20)

SPIE Journal Paper | 12 September 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Metrology, Line width roughness, Scanning electron microscopy, Digital filtering, Atomic force microscopy, Standards development, Semiconductors, Image acquisition, Image quality, Electron microscopes

SPIE Journal Paper | 8 September 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Line width roughness, Extreme ultraviolet, Fin field effect transistors, Edge detection, Semiconductors, Metrology, Ion beams, Electron microscopes, Line edge roughness, Transmission electron microscopy

SPIE Journal Paper | 23 July 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Line edge roughness, Scanning electron microscopy, Edge detection, Signal to noise ratio, Detection and tracking algorithms, Critical dimension metrology, Image filtering, Stochastic processes, Metrology, Reliability

SPIE Journal Paper | 15 June 2018
JM3 Vol. 17 Issue 02
KEYWORDS: Semiconducting wafers, Oxides, Transmission electron microscopy, Etching, Thin films, Ellipsometry, Electron microscopes, Wafer testing, Edge detection, Thin film devices

Proceedings Article | 28 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Semiconductors, Metrology, Image acquisition, Atomic force microscopy, Scanning electron microscopy, Time metrology, Finite element methods, Line width roughness, Semiconducting wafers, Standards development

Proceedings Article | 22 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Semiconductors, Edge detection, Metrology, Fin field effect transistors, Denoising, Transmission electron microscopy, Extreme ultraviolet, Line width roughness, Line edge roughness

Showing 5 of 20 publications
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