Mr. Masamichi Yoshida
at Sony Semiconductor Manufacturing Corp
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | April 20, 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Semiconductors, Image processing, Scanning electron microscopy, Signal processing, Inspection equipment, Semiconductor manufacturing, Optical alignment, Computer aided design, Algorithm development, Semiconducting wafers

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, FT-IR spectroscopy, Etching, Polymers, Photoresist materials, Line width roughness, Chemical analysis, Semiconducting wafers, Plasma treatment, Plasma

PROCEEDINGS ARTICLE | August 20, 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Wafer-level optics, Image segmentation, Distortion, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Model-based design, Resolution enhancement technologies, Phase shifts

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