Prof. Masamori Endo
Professor at Tokai Univ
SPIE Involvement:
Senior status | Conference Program Committee | Author
Publications (49)

PROCEEDINGS ARTICLE | February 26, 2018
Proc. SPIE. 10512, Fiber Lasers XV: Technology and Systems
KEYWORDS: Optical fibers, Mirrors, Signal attenuation, Photons, Reflectivity, Fiber lasers, Scanning probe lithography, Laser damage threshold, Neodymium, Absorption

PROCEEDINGS ARTICLE | February 20, 2018
Proc. SPIE. 10513, Components and Packaging for Laser Systems IV
KEYWORDS: Numerical simulations, Wave propagation, Optical resonators, Gas lasers, Optical simulations, Cesium, Alkali vapor lasers

PROCEEDINGS ARTICLE | January 13, 2017
Proc. SPIE. 10254, XXI International Symposium on High Power Laser Systems and Applications 2016
KEYWORDS: Continuous wave operation, Switching, Photons, Reflectivity, Q switches, Semiconductor lasers, Optical resonators, Cesium, Pulsed laser operation

PROCEEDINGS ARTICLE | January 13, 2017
Proc. SPIE. 10254, XXI International Symposium on High Power Laser Systems and Applications 2016
KEYWORDS: Mirrors, Fluctuations and noise, Argon, Argon ion lasers, Numerical simulations, Semiconductor lasers, Thermal effects, Optical simulations, Helium, Cesium

PROCEEDINGS ARTICLE | April 22, 2016
Proc. SPIE. 9729, High Energy/Average Power Lasers and Intense Beam Applications IX
KEYWORDS: Diffraction, Laser development, Numerical simulations, Semiconductor lasers, Gas lasers, Diodes, Optical simulations, Modes of laser operation, Cesium, Radio propagation

PROCEEDINGS ARTICLE | February 3, 2015
Proc. SPIE. 9255, XX International Symposium on High-Power Laser Systems and Applications 2014
KEYWORDS: Mirrors, Continuous wave operation, Argon, Numerical simulations, Semiconductor lasers, Optical resonators, Gas lasers, Helium, Cesium, Absorption

Showing 5 of 49 publications
Conference Committee Involvement (3)
Lasers and Applications
30 August 2005 | Warsaw, Poland
Gas and Chemical Lasers, and Applications IV
26 January 2004 | San Jose, Ca, United States
Gas and Chemical Lasers and Intense Beam V
30 January 2003 | San Jose, CA, United States
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