Masanari Kajiwara
at Toshiba Corp
SPIE Involvement:
Publications (6)

Proceedings Article | 20 March 2018 Presentation + Paper
Proceedings Volume 10588, 105880I (2018)
KEYWORDS: Semiconducting wafers, Optical proximity correction, Wafer-level optics, Lithography, Feature extraction, Computer simulations, Photomasks, Calibration

Proceedings Article | 28 March 2014 Paper
Proceedings Volume 9053, 90530G (2014)
KEYWORDS: Lithography, Neodymium, Optical proximity correction, SRAF, Photomasks, Surface conduction electron emitter displays, Semiconductors, Critical dimension metrology, Image processing, Semiconducting wafers

Proceedings Article | 5 April 2012 Paper
Proceedings Volume 8324, 83241J (2012)
KEYWORDS: Optical lithography, Critical dimension metrology, Failure analysis, Lithography, Finite element methods, Process control, Photoresist processing, Reactive ion etching, Data modeling, Optimization (mathematics)

SPIE Journal Paper | 1 January 2011
JM3, Vol. 10, Issue 1, 013020, (January 2011)
KEYWORDS: Manufacturing, Tolerancing, Optical proximity correction, Design for manufacturability, Failure analysis, Optics manufacturing, Capacitance, Optical calibration, Clocks, Lithography

Proceedings Article | 3 April 2010 Paper
Proceedings Volume 7641, 76410L (2010)
KEYWORDS: Manufacturing, Tolerancing, Optical proximity correction, Failure analysis, Design for manufacturability, Capacitance, Clocks, Electronic design automation, Data conversion, Integrated circuit design

Showing 5 of 6 publications
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