Masanobu Honda
Director at Tokyo Electron Miyagi Ltd
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | April 27, 2017
Proc. SPIE. 10149, Advanced Etch Technology for Nanopatterning VI
KEYWORDS: Optical lithography, Etching, Ecosystems, Process control, Extreme ultraviolet, Line width roughness, Plasma etching, Line edge roughness, Photoresist processing, Plasma

PROCEEDINGS ARTICLE | March 17, 2012
Proc. SPIE. 8328, Advanced Etch Technology for Nanopatterning
KEYWORDS: Etching, Electrodes, Polymers, Ions, Silicon, Photoresist materials, Extreme ultraviolet, Line width roughness, Photoresist processing, Plasma

PROCEEDINGS ARTICLE | March 16, 2012
Proc. SPIE. 8328, Advanced Etch Technology for Nanopatterning
KEYWORDS: Etching, Polymers, Image processing, Sulfur, Plasma etching, Critical dimension metrology, Reactive ion etching, Carbon monoxide, Tolerancing, Plasma

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