It is known that the photolithography characteristic of the color resist film depends on the variety of the pigments and the exposure condition. Recently, the color filter containing the high density pigments is hoped to make the wide color gamut LCD panel. Then, it is very important to know the composition of the color resist film and the exposure condition to achieve a good balance between the color characteristic and the photolithography characteristic.
In this experiment, it is shown that the photolithography characteristics of Red and Blue resist films don't depend on the exposure illuminance easily in a range narrower than the width of the mask for the reason that the UV light goes into deeply without being absorbed by the pigments. However, in a range wider than the width of the mask or at very low exposure illuminance, their characteristics depend on the exposure illuminance by reason that the amount of the light irradiation decreases and the influence of the inhibition by oxygen becomes larger. On the other hand, it is shown that the photolithography characteristic of Green resist film depends on the exposure illuminance regardless of a range and the exposure illuminance value because the UV light can not go deeply into the coating by being absorbed by pigments in the resist. Thus, it is confirmed that the degree of curing and the pattern profile of color resist film is greatly different according to the composition and exposure condition.