CONFERENCE PROCEEDINGS
Advanced Search
Masaomi Kameyama
Executive Staff at Nikon Corp
SPIE Involvement:
Author
Publications (4)
Proceedings Article | 6 May 2009 Paper
Evolution of wavelength shrinkage in lithography
Proceedings Volume 7281, 728102 (2009) https://doi.org/10.1117/12.831424
KEYWORDS: Semiconducting wafers, Lithography, Photomasks, Lithographic illumination, Manufacturing, Optical lithography, Deep ultraviolet, Imaging systems, Photoresist materials, Resolution enhancement technologies
Proceedings Article | 19 November 2007 Paper
Immersion and 32nm lithography: now and future
Proceedings Volume 6724, 672402 (2007) https://doi.org/10.1117/12.782451
KEYWORDS: Lithography, Extreme ultraviolet lithography, Double patterning technology, Semiconducting wafers, Water, Imaging systems, Immersion lithography, Refractive index, Photoresist developing, Manufacturing
Proceedings Article | 20 August 2004 Paper
Extension of photolithography
Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557793
KEYWORDS: Optical lithography, Lithography, Manufacturing, Resolution enhancement technologies, Quartz, Transparency, Photomasks, Liquids, Refractive index, Pellicles
Proceedings Article | 1 June 1990 Paper
Image quality of higher NA I-line projection lens
Shinichi Nakamura, Koichi Matsumoto, Kazuo Ushida, Masaomi Kameyama
Proceedings Volume 1264, (1990) https://doi.org/10.1117/12.20181
KEYWORDS: Lithography, Manufacturing, Image quality, Optics manufacturing, Image resolution, Optical lithography, Photoresist processing, Very large scale integration, Prototyping, Projection systems
Proceedings Volume Editor (3)
Conference Committee Involvement (9)
SPIE Lithography Asia - Korea
13 October 2010 | n/a, Republic of Korea
5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing and Testing of Micro and Nano Optical Devices and Systems
26 April 2010 | Dalian, China
SPIE Lithography Asia - Taiwan
18 November 2009 | Taipei, Taiwan
4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems
19 November 2008 | Chengdu, Chengdu, China
SPIE Lithography Asia - Taiwan
4 November 2008 | Taipei, Taiwan
Showing 5 of 9 Conference Committees
LOAD MORE
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top