Masashi Ataka
Director, Development Div at Holon Co Ltd
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 20 October 2006 Paper
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Defect detection, Imaging systems, Air contamination, Inspection, Chromium, Scanning electron microscopy, Optical inspection, Photomasks, Computer aided design, Defect inspection

Proceedings Article | 9 November 2005 Paper
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Cadmium, Scanning electron microscopy, Software development, Photomasks, Computed tomography, Optical proximity correction, Raster graphics, Critical dimension metrology, Semiconducting wafers, Holons

Proceedings Article | 9 November 2005 Paper
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Calibration, Reliability, Very large scale integration, Optical proximity correction, Computer aided design, Critical dimension metrology, Data conversion, Prototyping, Standards development, Holons

Proceedings Article | 27 December 2002 Paper
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Wafer-level optics, Reticles, Statistical analysis, Calibration, Optical testing, Time metrology, Photomasks, Critical dimension metrology, Line edge roughness, Edge roughness

Proceedings Article | 18 December 1998 Paper
Proc. SPIE. 3546, 18th Annual BACUS Symposium on Photomask Technology and Management
KEYWORDS: Electron beams, Reticles, Contamination, Quartz, Chromium, Scanning electron microscopy, Photomasks, Critical dimension metrology, Optics manufacturing, Holons

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